A variety of microscopes ranging from low power inspection to a very high power, high resolution scanning electron microscope are available for characterization of samples. Cameras are also available for microscopic imaging.

A variety of monochrometers, spectrophotometers with integrating sphere, and an FTIR are available which covers the wavelength range from 0.3 to 20 microns.

Our deposition chambers are equipped with crystal thickness deposition monitors to measure thickness of films as they are grown. A Tencor alpha step profilometer is available for making mechanical measurements of film thicknesses and a Gaetner ellipsometer is available for measuring the refractive index and optical thicknesses of films.

Electronic instrumentation is available for making most characterization measurements. Special equipment includes a solar simulator for measuring photovoltaic devices and four point probe for measuring properties of diffused semiconductor wafers. In addition, EDTEK offers extensive data acquisition capabilities (both hardware and software) to assist with process analysis, measurement, and control.

EDTEK has a skilled and experienced staff for planning and designing difficult experiments and simulating design conditions. A variety of hardware is available for setup and conducting experiments. Typical test conditions involve vacuum or environmental control, thermal control, illumination with defined spectrum, and electrical instrumentation and computerized data acquisition.

The EDTEK staff has years of experience in creating mathematical models for the physical performance of devices. Examples of these models include three-dimensional ray tracing of optical systems, modeling of the electromagnetic performance of resonant antenna array optical filters, and modeling of semiconductor photovoltaic devices.